Effects of magnetic field on pulse wave forms in plasma immersion ion implantation in a radio-frequency, inductively coupled plasma

Journal of Applied Physics

Volumn 92, Issue 5, 2002, Pages 2284-2289

  Tong, Honghui ^a,b   Fu, Ricky K Y ^a   Tang, Deli ^a,b   Zeng, Xuchu ^a   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b SOUTHWESTERN INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBING EFFICIENCY; EXTERNAL MAGNETIC FIELD; HIGH MAGNETIC FIELDS; MAGNETIC CONFINEMENT; NONUNIFORMITY; PLANAR ELECTRODE; PLASMA DENSITY GRADIENT; PLASMA DISCHARGE; PLASMA GENERATION; PLASMA IMMERSION ION IMPLANTATION; PULSE CURRENTS; PULSE WAVE; RADIO FREQUENCIES; RF-POWER; TIME-DEPENDENT CURRENTS; VACUUM CHAMBERS;

CHUCKS; ELECTRIC DISCHARGES; HYDROGEN; INDUCTIVELY COUPLED PLASMA; ION IMPLANTATION; PLASMA APPLICATIONS; PLASMA DENSITY; SILICON WAFERS;

MAGNETIC FIELDS;

EID: 0036732193     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1499983     Document Type: Article

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