Inductive plasma sources for plasma implantation and deposition

IEEE Transactions on Plasma Science

Volumn 26, Issue 6, 1998, Pages 1653-1660

  Tuszewski, Michel ^a   Henins, Ivars ^a   Nastasi, Michael ^a   Kent Scarborough, W ^a   Walter, Kevin C ^a   Lee, Doug H ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

Inductive plasma sources; Plasma deposition; Plasma ion implantation

Indexed keywords

DEPOSITION; ION IMPLANTATION; PLASMA CONFINEMENT; PLASMA DENSITY;

INDUCTIVE PLASMA SOURCES;

PLASMA SOURCES;

EID: 0032318154     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.747883     Document Type: Article

References (14)

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