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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2301-2306

Hydrogen-induced surface blistering of sample chuck materials in hydrogen plasma immersion ion implantation

(2) Chu, P K a Zeng, X a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; COALESCENCE; COMPUTER SIMULATION; CONTAMINATION; COOLING; ELECTRIC CONDUCTIVITY; HYDROGEN; IMPURITIES; ION IMPLANTATION; MICROMETERS; POLYSILICON; SILICA; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS; SPUTTERING; THERMAL EFFECTS;

HYDROGEN PLASMA IMMERSION ION IMPLANTATION; HYDROGEN PLASMA IMMERSION ION IMPLANTATION (PIII);

CHUCKS;

EID: 0035440115 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1384557 Document Type: Article

Times cited : (7)

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