Low pressure plasma immersion ion implantation of silicon

IEEE Transactions on Plasma Science

Volumn 26, Issue 6, 1998, Pages 1661-1668

  Fan, Zhi Neng ^a   Chen, Qing Chuan ^a   Chu, Paul K ^b   Chan, Chung ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b Northeastern University   (United States)

Author keywords

Plasma immersion ion implantation; Semiconductor processing; Silicon

Indexed keywords

ION IMPLANTATION; MATHEMATICAL MODELS; PLASMA APPLICATIONS;

PLASMA IMMERSION ION IMPLANTATION;

SEMICONDUCTING SILICON;

EID: 0032319703     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.747884     Document Type: Article

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