Asymmetric microtrenching during inductively coupled plasma oxide etching in the presence of a weak magnetic field

Applied Physics Letters

Volumn 72, Issue 11, 1998, Pages 1293-1295

  Schaepkens, Marc ^a   Oehrlein, Gottlieb S ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001487049     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121068     Document Type: Article

References (8)

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