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Volumn 46, Issue 9, 2002, Pages 1399-1403

Electrical properties of SiN/GaN MIS diodes formed by ECR-CVD

Author keywords

ECR; GaN; Gate dielectric; MISFET; Silicon nitride

Indexed keywords

CAPACITANCE; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; GALLIUM NITRIDE; INTERFACES (MATERIALS); PERMITTIVITY; REFRACTIVE INDEX; SEMICONDUCTING FILMS; SEMICONDUCTOR DIODES; SILICON NITRIDE;

EID: 0036721756     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00085-0     Document Type: Article
Times cited : (38)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.