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Volumn 46, Issue 9, 2002, Pages 1399-1403
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Electrical properties of SiN/GaN MIS diodes formed by ECR-CVD
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Author keywords
ECR; GaN; Gate dielectric; MISFET; Silicon nitride
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Indexed keywords
CAPACITANCE;
CHEMICAL VAPOR DEPOSITION;
ELECTRON CYCLOTRON RESONANCE;
GALLIUM NITRIDE;
INTERFACES (MATERIALS);
PERMITTIVITY;
REFRACTIVE INDEX;
SEMICONDUCTING FILMS;
SEMICONDUCTOR DIODES;
SILICON NITRIDE;
CHARGE DENSITIES;
MISFET DEVICES;
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EID: 0036721756
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/S0038-1101(02)00085-0 Document Type: Article |
Times cited : (38)
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References (19)
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