Determination of image placement accuracy due to EUV mask fabrication procedures

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 251-255

  Mikkelson, A R ^a   Engelstad, R L ^a   Lovell, E G ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Distortions; Extreme ultraviolet (EUV); Finite element modeling; Mask chucking; Mask fabrication

Indexed keywords

ELECTRON BEAMS; FINITE ELEMENT METHOD; MASKS; MICROELECTRONIC PROCESSING; ULTRAVIOLET RADIATION;

IMAGE PLACEMENT;

LITHOGRAPHY;

EID: 0036643934     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00536-1     Document Type: Conference Paper

References (1)

1. Predicting pattern transfer distortions during EUV mask fabrication