Interferometric testing of photomask substrate flatness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 844-851

  Evans, C J ^a   Parks, R E ^a   Shao, L Z ^a   Schmitz, T ^a   Davies, A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Flatness; Interferometry; Photomasks; Ritchey Common test

Indexed keywords

HELIUM NEON LASERS; INTERFEROMETRY; LIGHT POLARIZATION; OPTICAL RESOLVING POWER; SURFACE TESTING; WAVEFRONTS;

FLATNESS TESTING; PHOTOMASKS;

MASKS;

EID: 0034763504     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436725     Document Type: Conference Paper

References (19)

1. The interferoscope: A new type of interferometer with variable fringe separation
2. Specification for extreme ultraviolet lithography mask substrates
3. Newton, Fizeau and Haidinger interferometers
4. Interferometric metrology of photomask blanks: Approaches using 633 nm wavelength illumination
5. White light interferometer
6. Measurement of transparent plates with wavelength-tuned phase-shifting interferometry
7. Adjustable coherence depth in a geometrically desensitized interferometer
8. Multimode laser Fizeau interferometer for measuring the surface of a thin transparent plate
9. On the modern reflecting telescope and the making and testing of optical mirrors
10. Ray-trace analysis and data reduction methods for the ritchey-common test
11. Implementation of the Ritchey-Common test for 300 mm wafers
12. Absolute Ritchey-Common test for circular flats
13. Fringe scanning interferometers