Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur®

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4452, Issue , 2001, Pages 100-106

  Davis, Mark J ^a   Marker, A J ^a   Aschke, L ^b   Schubert, F ^b   Moersen, E ^b   Kohlmann, H ^b   Mitra, I ^b   Alkemper, J ^b   Muller R ^b   Taylor, J S ^b   Blaedel, K L ^c   Hector, S D ^d  

^a Schott Glass Technologies   (United States)

^b Schott Lithotec ^*  (Germany)

^c Laence Livermore National Lab   (United States)

^d MOTOROLA INC   (United States)

Author keywords

EUVL; Internal homogeneity; Thermal expansion; Zerodur

Indexed keywords

GLASS CERAMICS; OPTICS; REFRACTIVE INDEX; THERMAL EXPANSION;

COEFFICIENT OF THERMAL EXPANSION; EXTREME ULTRAVIOLET LITHOGRAPHY; INTERNAL HOMOGENEITY; INTERNAL QUALITY; PROJECTION OPTICS; SURFACE DEFECTS; SURFACE FINISH; ZERODUR;

LITHOGRAPHY;

EID: 18644377327     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.446884     Document Type: Article

References (8)

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