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Volumn 75, Issue 10, 1999, Pages 1476-1478

High speed patterning of a metal silicide using scanned probe lithography

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000460993     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124730     Document Type: Article
Times cited : (28)

References (18)
  • 16
    • 85034134391 scopus 로고    scopus 로고
    • note
    • Ellipsometry measurements were performed before and after the depassivation anneal and no changes were observed within the experimental error.
  • 17
    • 85034136372 scopus 로고    scopus 로고
    • note
    • The minimum feature size resolution of the surface oxidation was degraded on the depassivated surface because of the adsorbed water layer. Typical resolution was ∼60 nm compared with 30 nm for a hydrophobic surface.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.