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Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 661-666

Organosilane monolayer resists for scanning probe lithography

(2) Sugimura, Hiroyuki a,b Nakagiri, Nobuyuki a

a NIKON CORPORATION (Japan)

b NAGOYA UNIVERSITY (Japan)

Author keywords

Nanolithography; Organosilane; Scanning probe microscopy; Self assembled monolayer

Indexed keywords

EID: 0001647934 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.10.661 Document Type: Article

Times cited : (63)

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