Combination of photo and atomic force microscope lithographies by use of an organosilane monolayer resist

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 7 B, 1997, Pages

  Sugimura, Hiroyuki ^a   Nakagiri, Nobuyuki ^a  

^a Department of Neurosurgery Chikusa Hospital   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; IRRADIATION; MASKS; PHOTOLITHOGRAPHY; PROTECTIVE COATINGS; SUBSTRATES; ULTRAVIOLET RADIATION;

ATOMIC FORCE MICROSCOPE LITHOGRAPHY; LATERAL FORCE MICROSCOPY; ORGANOSILANE MONOLAYERS; PHOTOMASK; RESIST;

MONOLAYERS;

EID: 0031189457     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l968     Document Type: Article

References (13)