Sensitivity factors of CAR electron beam resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 442-452

  Medeiros, David R ^a   Petrillo, Karen ^a   Breyta, Greg ^a   Huang, Wu Song ^a   Moreau, Wayne ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Acid generation; Base additives; Chemically amplified resists; Contrast; Electron beam resists; Sensitivity

Indexed keywords

ALKALINITY; CHEMICAL RESISTANCE; DIFFUSION; ELECTRON BEAMS; NUCLEAR MAGNETIC RESONANCE; RADIATION; SENSITIVITY ANALYSIS;

CHEMICALLY AMPLIFIED RESISTS (CAR);

PHOTORESISTS;

EID: 0036031208     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474243     Document Type: Conference Paper

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