Investigation of deep UV resists by NMR: Residual casting solvents, chemistries, and PAG decomposition in film

Journal of Photopolymer Science and Technology

Volumn 12, Issue 4, 1999, Pages 625-636

  Ito, Hiroshi ^a   Sherwood, Mark ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Acid catalyzed deprotection; Castingsolvents; Chemical amplification; Hydroxystyrene copolymers; Nuclear magnetic resonance spectroscopy; Photochemical acid generators; Protected polyhydroxystyrene

Indexed keywords

EID: 0000448151     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.625     Document Type: Article

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