High-throughput e-beam stepper lithography

Solid State Technology

Volumn 43, Issue 5, 2000, Pages 118-122

  Okamoto, Kazuya ^a   Suzuki, Kazuaki ^a   Pfeiffer, Hans C ^b   Sogard, Michael ^c  

^a NIKON CORPORATION   (Japan)

^b IBM MICROELECTRONICS   (United States)

^c Nikon Res Corporation of America   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTRON LENSES; ELECTROOPTICAL DEVICES; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; MICROPROCESSOR CHIPS;

CURVILINEAR VARIABLE AXIS LENSES; ELECTRON BEAM STEPPER; ELECTRON OPTICAL SYSTEM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034188562     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (13)

1. T.M. Bloomstein et al., J. Vac. Sci. Technol., B 15, 2112, 1997.
2. C. Gwyn, et al., J. Vac. Sci. Technol., B 16, 3142, 1998.
3. S.D. Berger, J.M. Gibson, Appl. Phys. Lett., 57, 153, 1990.
4. H.C. Pfeiffer, Jpn. J. Appl. Phys., 34, 6658, 1995.
5. H.C. Pfeiffer et al., Abs. 43rd Int. Conf. Electron, Ion, Photon Beam Technology, and Nanofabrication, paper NGL2-1, 1999.
6. H.C. Pfeiffer, G.O. Langner, J. Vac. Sci. Technol., 19, 1058, 1981.
7. W. Stickel, J. Vac. Sci. Technol., B 16, 3211, 1998.
8. S.D. Golladay, R.A. Kendall, S.K. Doran, Abs. 43rd Int. Conf. Electron, Ion, Photon Beam Technology, and Nanofabrication, paper SO4, 1999.
9. W. Stickel, G.O. Langner, Abs. 43rd Int. Conf. Electron, Ion, Photon Beam Technology, and Nanofabrication, paper SOP6, 1999.
10. S. Kojima, et al., Ext. Abs. 60th Autumn Meeting of Japan's Applied Physics Society, paper 4-a-E3 (in Japanese), 1999.
11. S. Kawata, et al., Abs. 43rd Int. Conf. Electron, Ion, Photon Beam Technology, and Nanofabrication, paper MP2, 1999.
12. K. Uchikawa et al., Abs. 43rd Int. Conf. Electron, Ion, Photon Beam Technology, and Nanofabrication, paper NGL6-3, 1999.
13. K. Morita et al., Jpn. J. Appl. Phys., to be published.