Analytical model of the `shot noise' effect in photoresist

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 365-368

  Gallatin, Gregg M ^a   Liddle, J Alexander ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; SHOT NOISE; STATISTICS; SURFACE ROUGHNESS;

POST EXPOSURE BAKE;

PHOTORESISTS;

EID: 0033131706     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00105-7     Document Type: Article

References (7)

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2. 2. S. Turner, et. al., J. Vac. Sci. Technol. B 9, (1991) 3440.
3. 3. Scheckler, et.al., 1993 Symposium on VLSI Technology Digest of Papers, (1993) 149.
4. 4. T. Yoshimura, et. al., Appl. Phys. Lett. 63, (1993) 764.
5. 5. J. Nakamura, et. al., J. Photopolymer Sci and Tech. 11, (1998) 571.
6. 6. N. Rau, et. al., S. Palmateer, et. al., H. Namatsu, et. al, EIPBN 98
7. 7. D. He and F. Cerrina, Process Dependence of Roughness in Chemically Amplified Resists, Preprint.