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Journal of Photopolymer Science and Technology

Volumn 13, Issue 3, 2000, Pages 391-394

Resist characteristics with electron beam and SR exposures

(5) Ishikawa, Kiyoshi a Sato, Mitsuru b Komano, Hiroshi a Kumada, Teruhiko c Sumitani, Hiroaki c

a TOKYO OHKA KOGYO CO LTD (Japan)

b OHKA Amarica ^*

c MITSUBISHI ELECTRIC CORPORATION (Japan)

Author keywords

CD uniformity; Chemically amplified resist; Sensitivity; Synchrotron radiation

Indexed keywords

ARTICLE; ELECTRON BEAM; ILLUMINATION; RADIATION EXPOSURE; RADIATION PROTECTION; SEMICONDUCTOR; SYNCHROTRON; TECHNIQUE;

EID: 0034583960 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.13.391 Document Type: Article

Times cited : (3)

References (15)

1
- 0010165024
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3286
- Cui, Z.¹ Gerardino, A.² Gentili, M.³ DiFabrizio, E.⁴ Prewett, P.D.⁵

2
- 0033260753
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2873
- Sato, M.¹ Ocala, L.E.² Novembre, A.E.³ Ohmori, K.⁴ Ishikawa, K.⁵ Katsumata, K.⁶ Nakayama, T.⁷

3
- 0040708648
- (1999) J. Vac. Sci. Technol. , vol.17 , pp. 2970
- Cardinale, G.F.¹ Henderson, C.C.² Goldsmith, J.E.M.³ Mangat, P.J.S.⁴ Cobb, J.⁵ Hector, S.D.⁶

4
- 1542791333
- (1996) ACS Symp. Ser. , vol.620 , pp. 387
- Ito, H.¹ Breyta, G.² Hofer, D.³ Pomerene, A.⁴ Petrillo, K.⁵ Seeger, D.⁶

5
- 0040707393
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 3356
- Szmanda, C.R.¹ Brainard, R.L.² Mackevich, J.F.³ Awaji, A.⁴ Tanaka, T.⁵ Yamada, Y.⁶ Bohland, J.⁷ Tedesco, S.⁸ Dal'Zotto, B.⁹ Bruenger, W.¹⁰ Torkler, M.¹¹ Fallmann, W.¹² Loeschner, H.¹³ Kaesmaier, R.¹⁴ Nealey, P.M.¹⁵ Pawloski, A.R.¹⁶

6
- 0010172058
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 609
- Kumada, T.¹ Adachi, H.² Watanabe, H.³ Sumitani, H.⁴

7
- 19644379107
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 6863
- Kim, J.-S.¹ Choi, C.-I.² Kim, M.-S.³ Bok, C.-K.⁴ Kim, H.-S.⁵ Baik, K.-H.⁶

8
- 0010125714
- (1998) Jpn. J. Appl. Phys. , vol.37 , pp. 6830
- Nakamura, J.¹ Kawai, Y.² Deguchi, K.³ Matsuda, T.⁴ Oda, M.⁵

9
- 0010219546
- Tokyo: Kyoritsu
- (1963) Kagaku Daijiten

10
- 0003668260
- Tokyo: Maruzen
- (1993) th ed.

11
- 0003446724
- London: Chapman & Hall
- (1996) Dictionary of Organic Compounds

12
- 0010169140
- (1955) Bull. Soc. Chim. Fr. , pp. 554-556
- Rumpf¹

13
- 0003446724
- London: Chapman & Hall
- (1996) Dictionary of Organic Compounds

14
- 84996012833
- (1986) Bunseki Kagaku , vol.35 , Issue.2 , pp. 90
- Shinobu, S.¹ Abe, M.² Suzuki, Y.³ Koike, H.⁴

15
- 0003446724
- London: Chapman & Hall
- (1996) Dictionary of Organic Compounds

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.