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Journal of Photopolymer Science and Technology

Volumn 11, Issue 4, 1998, Pages 555-564

Negative EB Resist Materials Using Anisotropic Acid-Diffusion Based on Acid-Catalyzed Dehydration of Phenylcarbinols

(1) Uchino, Shou Ichi a

a High Performance Materials Department (Japan)

Author keywords

Anisotropic acid diffusion; Negative electron beam resist; Phenylcarbinol; Poly(4 hydroxystyrene)

Indexed keywords

EID: 0001310986 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.11.555 Document Type: Article

Times cited : (10)

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