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Volumn 14, Issue 4, 2001, Pages 547-554
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Image formation in electron projection and e-beam direct write lithography resists
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Author keywords
EPL; Monte Carlo; Resists; Simulation
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Indexed keywords
ARTICLE;
ELECTRON BEAM;
ELECTRON PROJECTION LITHOGRAPHY;
IONIZATION;
LITHOGRAPHY;
MODEL;
MONTE CARLO METHOD;
SPECTROPHOTOMETRY;
ULTRAVIOLET IRRADIATION;
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EID: 0035747074
PISSN: 09149244
EISSN: None
Source Type: Journal
DOI: 10.2494/photopolymer.14.547 Document Type: Article |
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Times cited : (6)
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References (10)
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