Advantages of using the CAR for photomask manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue , 2001, Pages 331-340

  Kondoh, T ^a   Itoh, M ^a   Taniguchi, R ^a   Ohtsubo, K ^a   Sakai, M ^a   Watanabe, H ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Acetal; Chemically amplified; Dark reaction; E beam; Resist; Vacuum

Indexed keywords

COATINGS; ELECTRON BEAMS; MASKS; POLYMERS; REACTIVE ION ETCHING; TEMPERATURE; VACUUM APPLICATIONS;

ACETAL; CHEMICALLY AMPLIFIED RESIST; DARK REACTION; POST COATING DELAY EFFECT;

PHOTORESISTS;

EID: 0035185077     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.438349     Document Type: Conference Paper

References (5)