Fabrication of nanometer-scale features by controlled isotropic wet chemical etching

Advanced Materials

Volumn 13, Issue 8, 2001, Pages 604-607

  Love, J Christopher ^a   Paul, Kateri E ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRON BEAMS; ETCHING; GRAIN SIZE AND SHAPE; METALLIC FILMS; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PHOTORESISTS; SURFACE ROUGHNESS; ULTRAVIOLET SPECTROSCOPY; WETTING;

DEEP ULTRAVIOLET; EDGE LITHOGRAPHY; ELECTRON BEAM WRITING; ISOTROPIC WET CHEMICAL ETCHING; NANOMETER-SCALE FEATURES; PHOTORESIST PATTERN;

NANOSTRUCTURED MATERIALS;

EID: 0035906180     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200104)13:8<604::AID-ADMA604>3.0.CO;2-J     Document Type: Article

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