Fabrication of field emission Si-tip array using reduced submicron masks generated by isotropic etching of mask patterns

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 423-426

  Kim, D W ^a   Lym, S H ^a   Jung, M Y ^b   Jeon, H T ^c   Choi, S S ^a  

^a SunMoon University   (South Korea)

^b Yonsei University   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROFLUORIC ACID; MASKS; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SILICA;

BUFFERED HYDROFLUORIC ACID;

MICROELECTRONIC PROCESSING;

EID: 0033131586     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00124-0     Document Type: Article

References (5)

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3. 3. J. A. Oro and D. D. Ball, J. Vac. Sci. Technol. B 11, (1993) 464
4. 4. T. Utsumi, IEEE Transactions on Electron Devices, 38, (1991) 2276
5. 5. N.E. McGruer, K. Warner, P. Singhal, J.J. Gu, and C. Chan, IEEE Transactions on Electron Devices, 38, (1991) 2389