Metal wire definition by high resolution imprint and lift-off

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 179-181

  Eisert, D ^a,b   Braun, W ^b   Kuhn, S ^b   Koeth, J ^a,b   Forchel, A ^b  

^a NANOPLUS NANOSYSTEMS AND TECHNOLOGIES GMBH   (Germany)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ETCHING; SEMICONDUCTING SILICON;

HIGH RESOLUTION IMPRINTS; LIFT OFF; METAL WIRE DEFINITION;

MICROELECTRONIC PROCESSING;

EID: 0033133112     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00056-8     Document Type: Article

References (4)

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3. 3. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhuang, J. Vac. Sci. Technol. B 15 (1997) 2897.
4. 4. L. Guo, P. R. Krauss, and S. Y. Chou, Appl. Phys. Lett. 71 (1997) 1881.