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Journal of Applied Physics

Volumn 89, Issue 12, 2001, Pages 7924-7931

Spectroscopic properties of nitrogen doped hydrogenated amorphous carbon films grown by radio frequency plasma-enhanced chemical vapor deposition

(7) Hayashi, Y a Yu, G a Rahman, M M a Krishna, K M a Soga, T a Jimbo, T a Umeno, M a

a NAGOYA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035875652 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1371268 Document Type: Article

Times cited : (57)

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