Determination of optical constants of solgel-derived inhomogeneous TiO2 thin films by spectroscopic ellipsometry and transmission spectroscopy

Applied Optics

Volumn 37, Issue 4, 1998, Pages 691-697

  Mosaddeq Ur Rahman, Md ^a,b   Yu, Guolin ^a,c   Murali Krishna, Kalaga ^a,c   Soga, Tetsuo ^a,d   Watanabe, Junji ^a,c   Jimbo, Takashi ^a,d   Umeno, Masayoshi ^a,b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITÉ PARIS SACLAY   (France)

^c Research Center for Micro Structure Devices   (United States)

^d UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; ELLIPSOMETRY; LIGHT SCATTERING; LIGHT TRANSMISSION; OPTICAL FILMS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SOL-GELS; SPECTRUM ANALYSIS; TITANIUM DIOXIDE; VOLUME FRACTION;

BAND GAP; FITTING ANALYSIS; SOLGEL DIP COATING METHOD; VITREOUS SILICA SUBSTRATE;

SEMICONDUCTING FILMS;

EID: 0006830470     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.000691     Document Type: Article

References (15)

1. M. Gratzel, “Nanocrystalline electronic junctions, ” in Semiconductor Nanoclusters-Physical, Chemical and Catalytic Aspects, P. V. Kamat and D. Meisel, eds. (Elsevier, The Netherlands, 1997), pp. 353-461.
2. J. M. Bennett, E. Pelletier, G. Albrand, J. P. Borgogno, B. Lazarides, C. K. Carniglia, R. A. Schmell, T. H. Allen, T. Tuttle-Hart, K. H. Guenther, and A. Saxer, “Comparison of the properties of titanium dioxide films prepared by various techniques, ” Appl. Opt. 28, 3303-3316 (1989).
3. G. Parjadis de Lariviere, J. M. Frigerio, J. Rivory, and F. Abeles, “Estimate of the degree of inhomogeneity of the refractive index of dielectric films from spectroscopic ellipsometry, ” Appl. Opt. 31, 6059-6061 (1992).
4. J. P. Borgogno, F. Flory, P. Roche, B. Schmitt, G. Albrand, E. Pelletier, and H. A. Macleod, “Refractive index and inhomogeneity of thin films, ” Appl. Opt. 23, 3567-3570 (1984).
5. A. R. Forouhi and I. Bloomer, “Calculation of optical constants, n and k, in the interband region, ” in Handbook of Optical Constants of Solids II, E. D. Palik, ed. (Academic, Toronto, 1991), Chap. 7.
6. S. Y. Kim, “Simultaneous determination of refractive index, extinction coefficient, and void distribution of titanium dioxide thin film by optical methods, ” Appl. Opt. 35, 6703-6707 (1996).
7. 2 film prepared by solgel method, ” Mater. Sci. Eng. B41, 67-71 (1996).
8. C. K. Carniglia, “Ellipsometric calculations for nonabsorbing thin films with linear refractive-index gradients, ” J. Opt. Soc. Am. A7, 848-856 (1990).
9. D. E. Aspnes and J. B. Theeten, “Investigation of effective-medium models of microscopic surface roughness by spectroscopic ellipsometry, ” Phy. Rev. B20, 3292-3302 (1979).
10. T. Gerfin and M. Gratzel, “Optical properties of tin-doped indium oxide determined by spectroscopic ellipsometry, ” J. Appl. Phys. 79, 1722-1729 (1996).
11. 2 films on silicon substrates, ” Thin Solid Films207, 180-184 (1992).
12. T. M. Susan, J. Chen, K. Vedam, and R. E. Newnham, “In situ annealing studies of solgel ferroelectric thin films by spectroscopic ellipsometry, ” J. Am. Ceram. Soc. 78, 1907-1913 (1995).
13. Y. Mishima, M. Takei, T. Uematsu, N. Matsumoto, T. Kakehi, U. Wakino, and M. Okabe, “Polycrystalline silicon formed by ultrahigh-vacuum sputtering system, ” J. Appl. Phys. 78, 217-223 (1995).
14. H. A. Macleod, Thin-Film Optical Filters (Adam Hilger, Bristol, UK, 1986).
15. 2 films, ” J. Appl. Phys. 71, 1421-1427 (1992).