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Volumn 593, Issue , 2000, Pages 499-504

Photoconductivity and photoluminescence of amorphous carbon nitride A-CNx films prepared by the layer-by-layer method

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARBON INORGANIC COMPOUNDS; ELECTRIC CONDUCTIVITY; ELECTRONIC DENSITY OF STATES; FILM PREPARATION; HYDROGENATION; PHOTOCONDUCTIVITY; PHOTOLUMINESCENCE; PHOTOSENSITIVITY; SPECTRUM ANALYSIS;

EID: 0033685307     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (11)

References (9)
  • 4
    • 0343740713 scopus 로고    scopus 로고
    • Amorphous and Microcrystalline Silicon Technology, edited by R.Schropp, H. M. Branz, M. Hack, I. Shimizu, S. Wagner San Francisco, CA
    • H. Furukawa, S. Nitta, M. Hioki, T. Iwasaki, T. Itoh and S. Nonomura in Amorphous and Microcrystalline Silicon Technology, edited by R.Schropp, H. M. Branz, M. Hack, I. Shimizu, S. Wagner (Mater. Res. Soc. Proc. 507, San Francisco, CA, 1998) pp.465.
    • (1998) Mater. Res. Soc. Proc. , vol.507 , pp. 465
    • Furukawa, H.1    Nitta, S.2    Hioki, M.3    Iwasaki, T.4    Itoh, T.5    Nonomura, S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.