Influence of deposition condition and hydrogen on amorphous-to-polycrystalline SiCN films

Thin Solid Films

Volumn 348, Issue 1, 1999, Pages 114-121

  Gong, Zheng ^a   Wang, E G ^a   Xu, G C ^a   Chen, Yan ^b  

^a INSTITUTE OF PHYSICS   (China)

^b UNIVERSITY AT BUFFALO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMPOSITION; COMPOSITION EFFECTS; HYDROGEN; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SYNTHESIS (CHEMICAL); X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ENERGY DISPERSIVE X RAY ANALYSIS; HYDROGEN FLOW RATIO; SILICON CARBON NITRIDE FILMS;

AMORPHOUS FILMS;

EID: 0032664392     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00020-6     Document Type: Article

References (44)

1. Narushimo T., Goto T., Iguchi Y., Hirai T. J. Am. Ceram. Soc. 73:1990;3580.
2. Morkoc H., Strite S., Gao G.B., Lin M.E., Sverdlov B., Burns M. J. Appl. Phys. 76:1994;1363.
3. Kern W., Rosler R.S. J. Vac. Sci. Technol. 14:1977;1082.
4. Spalvins T. Thin Solid Films. 108:1983;175.
5. Rice G.W., Woodin R.L. J. Mater. Res. 4:1989;1538.
6. Gonsalves K.E., Strutt P.R., Xiao T.D., Klemens P.G. J. Mater. Sci. 27:1992;3231.
7. Riedel R., Passing G., Schontelder H., Brook R.J. Nature. 355:1992;714.
8. Song Y.C., Zhao Y., Feng C.X., Lu Y. J. Mater. Sci. 29:1994;5745.
9. Suzuki M., Manielte Y., Nakata Y., Oktani T., Uosaki K. J. Am. Ceram. Soc. 76:1993;1195.
10. Alexandrescu R., Morjan I., Borsella E., Botti S., Fantoni R., Giorgi R., Enzo S. J. Mater. Res. 6:1991;2442.
11. Gheorghiu G., Senemaud C., Roulet H., Dufour G., Moreno T., Bodeur S., Reynaud C., Cauchetier M., Luce M. J. Appl. Phys. 72:1992;4118.
12. Komateu S., Hirohata Y., Fukuda S., Hino T., Yamashina T., Hata T. and K. Kusakabe. Thin Solid Films. 193/194:1990;917.
13. Novikov N.V., Voronkin M.A., Zaika N.I. Diam. Relat. Mater. 1:1992;80.
14. He Z., Carter G., Colligon J.S. Thin Solid Films. 283:1996;90.
15. Uslu C., Park B., Poker D.B. J. Elec. Mater. 25:1996;23.
16. Zhang W., Zhang K., Wang B. Mater. Sci. Eng. B26:1994;133.
17. Chen L.C., Yang C.Y., Bhusari D.M., Chen K.H., Lin M.C., Lin J.C., Chuang T.J. Diam. Rel. Mater. 5:1996;514.
18. Bendeddouche A., Berjoan R., Beche E., Merle-Mejean T., Schamm S., Serin V., Tailades G., Hillel R. J. Appl. Phys. 81:1997;6147.
19. Riedel R., Greimer A., Miehe G., Dressler W., Fuess H., Bill J., Aldinger F. Ang. Chem. Int. Ed. Engl. 36:1997;603.
20. Wang Chenzang, Dai E.G. Wang. Q.Y. J. Appl. Phys. 83:1998;1975.
21. Cohen M.L. Phys. Rev. B32:1985;7988.
22. Liu A.Y., Cohen M.L. Science. 245:1989;841.
23. Han H., Feldman B.J. Solid State Commun. 65:1988;921.
24. Li D., Chung Y.W., Sproul W.D. J. Appl. Phys. 74:1993;219.
25. Niu C., Lu Y.Z., Lieber C.M. Science. 261:1993;334.
26. Marton D., Boyd K.J., Al-Dayati A.H., Todorov S.S., Rabalais J.W. Phys. Rev. Lett. 73:1994;118.
27. Wang E.G. Prog. Mater. Sci. 41:1997;244.
28. Hughbanks T., Tain Y. Solid State Commun. 96:1995;321.
29. Teter D.M., Hemley R.J. Science. 271:1996;53.
30. Badding J.V., Nesting D.C. Chem. Mater. 8:1997;535.
31. Chen Y., Gou L.P., Wang E.G. Phil. Mag. Lett. 75:1997;155.
32. Chen Y., Chen F., Wang E.G. J. Mater. Res. 13:1998;126.
33. Kubler L., Bischoff J.L., Bolmont D. Phys. Rev. B38:1988;13113.
34. Wagner C.D., Passoja D.E., Hillery H.F., Kiniski T.G., Six H.A., Jansen W.T., Taylor J.A. J. Vac. Sci. Technol. 21:1982;933.
35. Ogata K., Chubaci J.F.D., Fujimoto F. J. Appl. Phys. 76:1994;3791.
36. Karcher R., Ley L., Johnson R.L. Phys. Rev. B30:1984;1896.
37. Zheng W.T., Sjostrom H., Ivanov I., Xing K.Z., Broitman E., Salaneck W.R., Greene J.E., Sundgren J.E. J. Vac. Sci. Technol. A14:1996;2696.
38. Cuomo J.J., Leary P.A., Yu D., Reuter W., Frisch M. J. Vac. Sci. Technol. 16:1979;299.
39. Kaplan R. J. Appl. Phys. 56:1984;1636.
40. Ronning C., Feldermann H., Merk R., Hofsass H., Reimke P. J.U. Thiele. Phys. Rev. B58:1998;2207.
41. Mansour A., Oelhafen P. Appl. Phys. A: Solids Surf. 58:1994;437.
42. Souto S., Pickholz m., dos Santos M.C., Alvarez F. Phys. Rev. B. 57:1998.
43. Souto S., Alvarez F. Appl. Phys. Lett. 70:1997;1539.
44. Bishcoff J.L., Kubler L., Bolmont D. Surf. Sci. 209:1989;115.