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Thin Solid Films

Volumn 397, Issue 1-2, 2001, Pages 70-77

Chemical vapor deposition of copper film from hexafluoroacetyl-acetonateCu(I)vinylcyclohexane

(2) Choi, Kyeong Keun a Rhee, Shi Woo a

a Pohang University of Science and Technology (POSTECH) (South Korea)

Author keywords

Chemical vapor deposition; Copper; Hexafluoroacetyl acetonateCu (I)vinylcyclohexane; Metallization

Indexed keywords

COPPER; ELECTRIC CONDUCTIVITY; METALLIZING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; PHYSICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); TEMPERATURE; VAPOR PRESSURE;

ORGANOMETALLIC PRECURSORS;

THIN FILMS;

EID: 0035500308 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01406-7 Document Type: Article

Times cited : (32)

References (22)

1
- 0031142982
- (1997) Mater. Sci. Eng. R , vol.19 , pp. 87
- Muraka, S.P.¹

2
- 5544255487
- (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 1828
- Braeckelmann, G.¹ Manager, D.² Bruke, A.³ Peterson, G.G.⁴ Kaloyeros, A.E.⁵ Reidsema, C.⁶ Omstead, T.R.⁷ Loan, J.F.⁸ Sullivan, J.⁹

3
- 22844456153
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2256
- Kobayashi, A.¹ Sekiguchi, A.² Koide, T.³ Okada, O.⁴ Zhang, M.⁵ Egami, A.⁶ Sunayama, H.⁷

4
- 0029323328
- (1995) Thin Solid Films , vol.262 , pp. 52
- Jain, A.¹ Gelatos, A.V.² Kodas, T.T.³ Hampden-Smith, M.J.⁴ Marsh, R.⁵ Mogab, C.J.⁶

5
- 0000721084
- (1998) Coordination Chem. Rev. , vol.178-180 , pp. 1785
- Doppelt, P.¹

6
- 0004004688
- VCH, Weinheim
- (1994) The Chemistry of Metal CVD
- Kodas, T.T.¹ Hampden-Smith, M.J.²

7
- 0032758495
- (1999) Electrochem. Solid-State Lett. , vol.2 , pp. 22
- Kang, S.W.¹ Park, M.Y.² Rhee, S.W.³

8
- 0034159254
- (2000) Electrochem. Solid-State Lett. , vol.3 , pp. 135
- Rhee, S.W.¹ Kang, S.W.² Han, S.H.³

9
- 0033097618
- (1999) J. Mater. Res. , vol.14 , pp. 975
- Park, M.Y.¹ Son, J.H.² Kang, S.W.³ Rhee, S.W.⁴

10
- 0032631833
- (1999) Thin Solid Films , vol.350 , pp. 10
- Kang, S.W.¹ Han, S.H.² Rhee, S.W.³

11
- 21144475976
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 863
- Cohen, S.L.¹ Liehr, M.² Kasi, S.³

12
- 0001607739
- (1996) J. Vac. Sci. Technol. A , vol.16 , pp. 3214
- Jin, C.H.¹ Kim, Y.T.² Baek, J.T.³ Yoo, H.J.⁴ Kim, D.R.⁵

13
- 0031168771
- (1997) J. Electrochem. Soc. , vol.144
- Senzaki, Y.¹ Kobayashi, M.² Charneski, L.J.³ Nguyen, T.⁴

14
- 0343783297
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1017
- Choi, E.S.¹ Park, S.K.² Shin, H.K.³ Lee, H.H.⁴

15
- 0029327498
- (1995) Thin Solid Films , vol.262 , pp. 46
- Norman, J.A.T.¹ Roberst, D.A.² Hochberg, A.K.³ Smith, P.⁴ Petersen, G.A.⁵ Parmeter, J.E.⁶ Apblett, C.A.⁷ Omstead, T.R.⁸

16
- 0001101509
- (1985) Organometallics , vol.4 , pp. 830
- Doyle, G.¹ Eriksen, K.A.² Van Engon, D.³

17
- 0001283272
- (1995) Chem. Mater. , vol.7 , pp. 1589
- Pinkas, J.¹ Huffman, J.C.² Baxter, D.V.³ Chisholm, M.H.⁴ Caulton, K.G.⁵

18
- 0024764747
- (1989) J. Electrochem. Soc. , vol.136 , pp. 3525
- Temple, D.¹ Reisman, A.²

19
- 0031210998
- (1997) J. Electrochem. Soc. , vol.144 , pp. 2829
- Nguyen, T.¹ Charneski, L.J.² Hsu, S.T.³

20
- 0031167125
- (1997) Jpn. J. Appl. Phys. , vol.36
- Hong, L.S.¹ Lin, M.Z.²

21
- 0002956533
- M.D. Allendorf and M.L. Hitchman (Eds.), Chemical Vapor Deposition XV, PV 2000-13, Pennington, NY
- The Electrochemical Society Proceeding Series
- Choi, K.K.¹ Rhee, S.W.²

22
- 0034251006
- (2000) IEEE Electron Device Lett. , vol.21 , pp. 384
- Hong, C.M.¹ Wagner, S.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.