Hexafluoroacetylacetonate Cu vinylcyclohexane as a liquid precursor for low-temperature chemical vapor deposition of copper thin films

Electrochemical and Solid-State Letters

Volumn 2, Issue 1, 1999, Pages 22-23

  Kang, Sang Woo ^a   Park, Man Young ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER; ELECTRIC CONDUCTIVITY OF SOLIDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); SUBSTRATES; THIN FILMS;

LIGANDS; LIQUID PRECURSORS;

ULSI CIRCUITS;

EID: 0032758495     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390721     Document Type: Article

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