Tribology on the macroscale to nanoscale of microelectromechanical system materials: A review

Proceedings of the Institution of Mechanical Engineers, Part J: Journal of Engineering Tribology

Volumn 215, Issue 1, 2001, Pages 1-18

  Bhushan, B ^a  

^a Ohio State University   (United States)

Author keywords

Microdevices; Microelectrochemical system (MEMS); Single crystal silicon; Tribology

Indexed keywords

AMORPHOUS FILMS; BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; FRACTURE TOUGHNESS; INTERFACES (MATERIALS); MICROHARDNESS; MONOLAYERS; POLYCRYSTALLINE MATERIALS; POLYSILICON; SILICON WAFERS; SINGLE CRYSTALS; SURFACE ROUGHNESS; TRIBOLOGY; WEAR OF MATERIALS;

LOW-PRESSURE CHEMICAL VAPOR DEPOSITION; SELF-ASSEMBLED MONOLAYERS;

MICROELECTROMECHANICAL DEVICES;

MICROELECTROMECHANICAL SYSTEM; REVIEW; SILICON; TRIBOLOGY;

EID: 0035065426     PISSN: 13506501     EISSN: None     Source Type: Journal    
DOI: 10.1243/1350650011541657     Document Type: Review

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