The influence of the ion flux density on the properties of molybdenum films deposited from the vapour phase under simultaneous argon ion irradiation

Thin Solid Films

Volumn 275, Issue 1-2, 1996, Pages 54-57

  Ensinger, W ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

Argon; Deposition process; Ion bombardment; Molybdenum

Indexed keywords

ALUMINA; ARGON; DEPOSITION; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; ION IMPLANTATION; IRRADIATION; MOLYBDENUM; OXYGEN; PHYSICAL PROPERTIES; QUARTZ; REDUCTION;

ARGON ION IRRADIATION; ION FLUX DENSITY; ION IRRADIATION INTENSITY; MICROPOROSITY; MOLYBDENUM FILMS;

METALLIC FILMS;

EID: 0030125372     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)07018-4     Document Type: Article

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