Structural investigations on ultrathin Mo layers in a-Si:H with emphasis on the island-continuous layer transition

Thin Solid Films

Volumn 342, Issue 1, 1999, Pages 127-135

  Lohmann M ^a   Klabunde, F ^a   Blasing J ^a   Veit, P ^a   Drusedau T ^a  

^a Inst Experimentelle Physik O   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; HYDROGEN; MAGNETRON SPUTTERING; MOLYBDENUM; MONOLAYERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS MATERIALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

X RAY REFLECTOMETRY (XRR);

ULTRATHIN FILMS;

EID: 0042699690     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01451-5     Document Type: Article

References (24)

1. Ying F., Smith R.W., Srolovitz D.J. Appl. Phys. Lett. 69:1996;20.
2. Adams D.P., Parfitt L.J., Bilello J.C., Yalisove S.M., Rek Z.U. Thin Solid Films. 266:1995;52.
3. Klabunde F., Löhmann M., Bläsing J., Drüsedau T.P. J. Appl. Phys. 80:1996;6266.
4. Maoujoud M., Kons P., Jardinier-Offergeld M., Bouillon F. Thin Solid Films. 238:1994;62.
5. Tanaka T., Kawabata K. Vacuum. 46:1995;1059.
6. Vink T.J., Somers M.A.J., Daams J.L.C., Dirks A.G. J. Appl. Phys. 70:1991;4301.
7. Hoffmann D.W., McCune R.C. Rossnagel S.M., Cuomo J.J., Westwood W.D. Handbook of Plasma Processing Technology. 1990;483 Noyes Publications, Park Ridge NJ.
8. J. Im, S. Yalisove, B. Adams, Y. Zhu, R. Chen (Eds.), Mater. Res. Soc. Symp. Proc., Vol. 376, 1997.
9. Stearns D.G., Rosen R.S., Vernon S.P. J. Vac. Sci. Technol. A. 9:1991;2662.
10. Naruse Y., Hatayama T. IEEE Trans. Nucl. Sci. 36:1989;1347.
11. Kloidt A., Stock H.J., Kleineberg U., Döhring T., Pröpper M., Schmiedeskamp B., Heinzmann U. Thin Solid Films. 228:1993;154.
12. Holloway K., Do K.B., Sinclair R. J. Appl. Phys. 65:1989;474.
13. Panckow A.N., Bläsing J., Drüsedau T.P. Non-Cryst. Solids. 164-166:1993;845.
14. Drüsedau T.P., Panckow A.N. Philos. Mag. Lett. 69:1994;333.
15. Latuske H.-M., Drüsedau T.P. Phys. Rev. B. 58:1997;2291.
16. Parrat L.G. Phys. Rev. 95:1954;359.
17. Drüsedau T.P., Klabunde F., Veit P., Hempel T. Phys. Status Solidi A. 161:1997;167.
18. Kim D.-E., et al. J. Vac. Sci. Technol. A. 15(4):1997.
19. Morgan W.L., Boercker D.B. Appl. Phys. Lett. 59:1991;1176.
20. Slaughter J.M., Schulze D.W., Hills C.R., Mirone A., Stalio R., Watts R.N., Tarrio C., Lucatorto T.B., Krumrey M., Mueller P., Falco C.M. J. Appl. Phys. 76:1994;2144.
21. Handbook of Photoelectron Spectroscopy, Perkin-Elmer Corporation, 1992.
22. Petford-Long A.K., Stearns M.B., Chang C.H., Nutt S.R., Stearns D.G., Ceglio N.N., Hawryluk A.M. J. Appl. Phys. 61:1987;1422.
23. H.J. Voorma, E. Louis, N.B. Koster, F. Bijkerk, M.J. van der Wiel, in: Mater. Res. Soc. Symp. Proc., Vol. 382, 1995.
24. Drüsedau T.P., Löhmann M., Garke B. J. Vac. Sci. Technol. A. 16:1998;2728.