Fully-depleted SOI CMOS technology for heterogeneous micropower, high-temperature or RF microsystems

Revue HF Tijdschrift

Volumn , Issue 2, 2001, Pages 53-68

  Raskin, J P ^a   Laconte, J ^a   Akheyar, A ^a   Dupont, C ^a   Adriaensen, S ^a   Neve A ^a   Dehan, M ^a   Parvais, B ^a   Vanhoenacker, D ^a   Demeus L ^a   Delatte, P ^a   Dessard, V ^a   Flandre, D ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; FABRICATION; HIGH TEMPERATURE APPLICATIONS; MICROELECTROMECHANICAL DEVICES; SILICON ON INSULATOR TECHNOLOGY; THIN FILMS;

INTEGRATED MICROSYSTEMS;

CMOS INTEGRATED CIRCUITS;

EID: 0034927050     PISSN: 00353248     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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