Electronic properties of partially crystalline SiOx suboxide films

IEEE Electron Device Letters

Volumn 21, Issue 12, 2000, Pages 569-571

  Wilk, G D ^a,b   Brar, B ^c  

^a TEXAS INSTRUMENTS   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c ROCKWELL SCIENCE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; ETCHING; FILMS; OXIDATION; TRANSMISSION ELECTRON MICROSCOPY;

SILICON SUBOXIDE;

SILICA;

EID: 0034498527     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.887468     Document Type: Article

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