Viscoelastic material behavior: models and discretization used in process simulator DIOS

IEEE Transactions on Electron Devices

Volumn 47, Issue 10, 2000, Pages 1999-2007

  Pomp, Andreas ^a,c   Zelenka, Stefan ^a   Strecker, Norbert ^b   Fichtner, Wolfgang ^a  

^a IEEE   (Switzerland)

^b ETH ZURICH   (Switzerland)

^c SYNOPSYS SWITZERLAND LLC   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTITUTIVE EQUATION; ELASTIC SOLID; PROCESS SIMULATORS; SOFTWARE PACKAGE DIOS-ISE;

COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; DIFFUSION; FINITE ELEMENT METHOD; HIGH TEMPERATURE APPLICATIONS; OXIDATION; SEMICONDUCTOR DEVICES; SHEAR STRESS; VISCOELASTICITY; VISCOSITY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0034297792     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.870589     Document Type: Article

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