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Volumn 35, Issue 8, 1996, Pages 4265-4273
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Stable solution method for viscoelastic oxidation including stress-dependent viscosity
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Author keywords
Oxidation induced stress; Process simulation; Thermal oxidation of silicon; Viscoelastic oxidation
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Indexed keywords
OXIDATION-INDUCED STRESS;
PROCESS SIMULATION;
THERMAL OXIDATION OF SILICON;
VISCOELASTIC OXIDATION;
CALCULATIONS;
COMPUTER SIMULATION;
OXIDATION;
SOLID SOLUTIONS;
VISCOELASTICITY;
SEMICONDUCTING SILICON;
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EID: 0030205497
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.35.4265 Document Type: Article |
Times cited : (10)
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References (14)
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