![]() |
Volumn 129, Issue 11, 1982, Pages 2594-2597
|
A Viscous Flow Model to Explain the Appearance of High Density Thermal Si02 at Low Oxidation Temperatures
|
Author keywords
annealing; oxidation; stress
|
Indexed keywords
SEMICONDUCTING SILICON - OXIDATION;
|
EID: 0020205589
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2123617 Document Type: Article |
Times cited : (206)
|
References (26)
|