Refractive index, relaxation times and the viscoelastic model in dry-grown SiO2 films on Si

Applied Physics Letters

Volumn 51, Issue 18, 1987, Pages 1416-1418

  Landsberger, L M ^a   Tiller, W A ^a  

^a STANFORD UNIVERSITY   (United States)

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Indexed keywords

EID: 0001732177     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.98642     Document Type: Article

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