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Journal of Applied Physics

Volumn 76, Issue 6, 1994, Pages 3285-3296

Analysis and application of a viscoelastic model for silicon oxidation

(5) Senez, Vincent a Collard, Dominique a Baccus, Bruno a Brault, Mathieu b Lebailly, Jacques b

a Institut Superieur de l'Electronique et du Numerique (France)

b Philips Components (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36448998751 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.357450 Document Type: Article

Times cited : (60)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.