Deposition of C-N films by reactive laser ablation

Applied Surface Science

Volumn 106, Issue , 1996, Pages 126-131

  D'Anna, E ^a   Luches, A ^a   Perrone, A ^a   Acquaviva, S ^a   Alexandrescu, R ^b   Mihailescu, I N ^b   Zemek, J ^c   Majni, G ^a  

^a INFM   (Italy)

^b INSTITUTE OF ATOMIC PHYSICS   (Romania)

^c INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRODEPOSITION; FILM PREPARATION; GAS LASERS; GRAPHITE; INFRARED SPECTROSCOPY; NITRIDES; POTASSIUM COMPOUNDS; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BACKSCATTERING MEASUREMENT; HARD FILMS;

LASER ABLATION;

EID: 0030565893     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00374-1     Document Type: Article

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