Growth of CNxHy films by reactive magnetron sputtering of carbon in Ar/NH3 discharges

Journal of Materials Research

Volumn 11, Issue 4, 1996, Pages 981-988

  Sjostrom H ^a   Lanford, W ^b   Hjorvarson B ^c   Xing, K ^a   Sundgren, J E ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b STATE UNIVERSITY OF NEW YORK   (United States)

^c UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBON INORGANIC COMPOUNDS; COMPOSITION; CRYSTAL MICROSTRUCTURE; ELASTICITY; FILM GROWTH; HARDNESS; HYDROGENATION; MAGNETRON SPUTTERING; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; NEGATIVE SUBSTRATE BIAS VOLTAGE; NUCLEAR REACTION ANALYSIS; REACTIVE MAGNETRON SPUTTERING; RESONANT BACKSCATTERING SPECTROSCOPY;

THIN FILMS;

EID: 0030126156     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1996.0123     Document Type: Article

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