Carbon nitride thin films deposited by reactive plasma beam sputtering

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 295-300

  Tessier, P Y ^a   Kre N'Guessan, R ^b   Angleraud, B ^a   Fernandez, V ^a   Mubumbila, N ^a   Turban, G ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b UNIVERSITÉ NANGUI ABROGOUA   (Côte d’Ivoire)

Author keywords

Carbon nitride; FTIR; Raman spectroscopy; Reactive sputtering; Thin films; XPS

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; CURRENT DENSITY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PARTIAL PRESSURE; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SILICON WAFERS; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; REACTIVE PLASMA BEAM SPUTTERING;

NITRIDES;

CARBONITRIDING; FILM; SPUTTERING;

EID: 0034055033     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00576-9     Document Type: Conference Paper

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