Reactive magnetron sputter deposited CNx: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2696-2701

  Zheng, W T ^a,b   Sjostrom H ^a   Ivanov, I ^a   Xing, K Z ^a   Broitman, E ^a,c   Salaneck, W R ^a   Greene, J E ^a,d   Sundgren, J E ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b JILIN UNIVERSITY   (China)

^c UNIVERSIDAD DE BUENOS AIRES   (Argentina)

^d UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030487320     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580190     Document Type: Article

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