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Volumn 332, Issue 1-2, 1998, Pages 118-123
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The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films
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Author keywords
Amorphous carbon; Electron energy loss spectra (EELS); Electronics; Joint density of states (JDOS); Microstructure
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Indexed keywords
CARBON;
CHEMICAL VAPOR DEPOSITION;
COMPOSITION EFFECTS;
DEFECTS;
ELECTRIC CONDUCTIVITY OF SOLIDS;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ELECTRONIC DENSITY OF STATES;
ELECTRONIC PROPERTIES;
MOLECULAR STRUCTURE;
OPTICAL PROPERTIES;
SEMICONDUCTING FILMS;
THIN FILMS;
AMORPHOUS CARBON FILMS;
DIAMOND LIKE CARBON (DLC) FILMS;
AMORPHOUS FILMS;
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EID: 0032476292
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(98)01070-0 Document Type: Article |
Times cited : (21)
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References (16)
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