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Volumn 332, Issue 1-2, 1998, Pages 118-123

The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films

Author keywords

Amorphous carbon; Electron energy loss spectra (EELS); Electronics; Joint density of states (JDOS); Microstructure

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DEFECTS; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC DENSITY OF STATES; ELECTRONIC PROPERTIES; MOLECULAR STRUCTURE; OPTICAL PROPERTIES; SEMICONDUCTING FILMS; THIN FILMS;

EID: 0032476292     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01070-0     Document Type: Article
Times cited : (21)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.