Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target

Thin Solid Films

Volumn 332, Issue 1-2, 1998, Pages 74-79

  Lu, T R ^a   Chen, L C ^b   Chen, K H ^c   Bhusari, D M ^c   Chen, T M ^a   Kuo, C T ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c ACADEMIA SINICA   (Taiwan)

Author keywords

Bio inorganic target; Carbon nitride; Ion beam sputtering; Mass spectrometry

Indexed keywords

ACTIVATION ENERGY; CARBON INORGANIC COMPOUNDS; CERAMIC COATINGS; FILM GROWTH; ION BEAMS; ION BOMBARDMENT; MASS SPECTROMETRY; MOLECULAR STRUCTURE; NUCLEATION; SPUTTER DEPOSITION; TARGETS; X RAY PHOTOELECTRON SPECTROSCOPY;

BIOMOLECULAR TARGETS; CARBON NITRIDE; ION BEAM SPUTTERING;

PROTECTIVE COATINGS;

EID: 0032476279     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01024-4     Document Type: Article

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