The preparation, characterization and tribological properties of TA-C : H deposited using an electron cyclotron wave resonance plasma beam source

Physica Status Solidi (A) Applied Research

Volumn 172, Issue 1, 1999, Pages 79-90

  Morrison, N A ^a   Muhl, S ^b   Rodil, S E ^a   Ferrari, A C ^a   Nesladek M ^c   Milne, W I ^a   Robertson, J ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c HASSELT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; DENSITY (SPECIFIC GRAVITY); DEPOSITION; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; FRICTION; HYDROGEN BONDS; HYDROGENATION; PLASMA SOURCES; RAMAN SCATTERING; STRESS ANALYSIS; TRIBOLOGY;

ELECTRON CYCLOTRON WAVE RESONANCE (ECWR) SOURCES; FRICTION COEFFICIENTS; ION ENERGY; OPTICAL GAP;

CARBON;

EID: 0033096953     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199903)172:1<79::AID-PSSA79>3.0.CO;2-C     Document Type: Article

References (27)

1. J. ROBERTSON, Progr. Solid State Chem. 21, 199 (1991).
2. K. ENKE, H. DIMIGEN, and H. HUBSCH, Appl. Phys. Lett 36, 291 (1980).
3. P. KOIDL et al., Mater. Sci. Forum 52, 41 (1989).
4. M. WEILER, S. SATTEL, T. GEISSEN, K. JUNG, H. EHRHARDT, V.S. VEERASAMY, and J. ROBERTSON, Phys. Rev. B 53, 1594 (1996).
5. S. SATTEL, J. ROBERTSON, and H. EHRHARDT, J. Appl. Phys. 82, 1 (1997).
6. D.R. MCKENZIE, D. MULLER, and B.A. PAILTHORPE, Phys. Rev. Lett. 67, 773 (1991).
7. H. EHRHARDT, R. KLEBER, A. KRUGER, W. DWORSCHAK, K. JUNG, I. MUIILING, F. ENGELKE, and H. METZ, Diamond Relat. Mater, 1, 316 (1992).
8. M. WEILER, S. SATTEL, K. JUNG, H. EHRHARDT, V.S. VEERASAMY, and J. ROBERTSON, Appl. Phys. Lett. 64, 2797 (1994).
9. M. WEILER, K. LANG, E. LI, and J. ROBERTSON, Appl. Phys. Lett, 72, 1314 (1998).
10. B. PFEIFFER, J. Appl. Phys. 37, 1624, 1628 (1966).
11. H. OECHSNER, Plasma Processing of Semiconductors, Ed. P.F. WILLIAMS, Kluwer Academic Press, Dordrecht 1990 (p. 157).
12. R. KRIMKE and H.M. URBASSEK, J. Appl. Phys, 81, 7163 (1997).
13. F.F. CHEN, in: Introduction to Plasma Physics, 3rd ed., Plenum Press, New York 1977.
14. P.J. FALLON, V.S. VEERASAMY, C.A. DAVIS, J. ROBERTSON, G.A.J. AMERATUNGA, W.I. MILNE, and J. KOSKINEN, Phys. Rev. B 48, 4777 (1993).
15. B.E. CHERRINGTON, Plasma Chem. and Plasma Processing 2, 113 (1982).
16. M. CHHOWALLA, J. ROBERTSON, C.W. CHEN, S.R.P. SILVA, C.A. DAVIS, G.A.J. AMARATUNGA, and W.I. MILNE, J. Appl. Phys. 81, 139 (1997).
17. B. DISCHLER, in: Europ. Mater. Res. Soc. Symp. Proc, Vol. 17, Les Editions de Physique, Les Ulis (France) 1987 (p. 189).
18. S. PRAWER, K.W. NUGENT, Y. LIFSHITZ, G.D. LEMPERT, E. GROSSMAN, J. KULIK, I. AVIGAL, and R. KALISH, Diamond Relat. Mater. 5, 433 (1996).
19. J. SCHWAN, S. ULRICH, V. BATORI, H. EHRHARDT, and S.R.P. SILVA, J. Appl. Phys. 80, 440 (1996).
20. J. ROBERTSON, Diamond Relat. Mater. 4, 297 (1995).
21. T. FRAUENHEIM, G. JUNGNICKEL, V. STEPHAN, P. BLAUDECK, S. DEUTSCMANN, M. WEILER, S. SATTEL, K. JUNG, and H. EHRHARDT, Phys. Rev. B 50, 7940 (1994).
22. J. MENEVE, E. DEKEMPENEER, S. KUYPERS, R. JACOBS, and J. SMEETS, Diamond Relat. Mater. 4, 366 (1995).
23. K. ENKE, Thin Solid Films 80, 227 (1981).
24. Y. LIFSHITZ, S.R. KASI, J.W. RABALAIS, and W. ECKSTEIN, Phys. Rev. B 41, 10468 (1990).
25. J. ROBERTSON, Diamond Relat. Mater. 2, 984 (1993);
26. J. ROBERTSON, Diamond Relat. Mater. 3, 361 (1994).
27. W. ECKSTEIN, Computer Simulations of Ion Solid Interactions, Springer-Verlag, New York 1990.