Deposition of tetrahedral hydrogenated amorphous carbon using a novel electron cyclotron wave resonance reactor

Applied Physics Letters

Volumn 72, Issue 11, 1998, Pages 1314-1316

  Weiler, M ^a   Lang, K ^b   Li, E ^c   Robertson, J ^d  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b CCR GmbH   (Germany)

^c Stormedia Inc   (United States)

^d UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 2442566590     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121069     Document Type: Article

References (20)

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