X-ray imaging: applications to patterning and lithography

Journal of Physics D: Applied Physics

Volumn 33, Issue 12, 2000, Pages

  Cerrina, F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIFFRACTION; IMAGING TECHNIQUES; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILMS;

FRESNEL DIFFRACTION; LOW ENERGY PHOTOELECTRON; X RAY IMAGING;

X RAY LITHOGRAPHY;

EID: 0033726723     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/12/201     Document Type: Article

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