Automatic mask generation in x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2238-2242

  Bollepalli, B S ^a   Khan, M ^a   Cerrina, F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040362266     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589621     Document Type: Article

References (6)

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2. J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill, New York, 1968).
3. N. Cobb and A. Zakhor, Proc. SPIE 2197, 313 (1995).
4. N. Cobb and A. Zakhor, Proc. SPIE 2440, 313 (1995).
5. Y. Liu, A. Zakhor, and A. M. Zuniga, IEEE Trans. Semiconduct. Manufacturing 9, 170 (Feb. 1996).
6. J. R. Maldonado et al., J. Vac. Sci. Technol. B 13, 3094 (1995).