Magnification correction by changing wafer temperature in proximity x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3411-3414

  Aoyama, H ^a   Mitsui, S ^a   Taguchi, T ^a   Tanaka, Y ^a   Matsui, Y ^a   Fukuda, M ^b   Suzuki, M ^b   Haga, T ^b   Morita, H ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033271272     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591021     Document Type: Article

References (7)

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